ZnO Ceramic Sputtering Target 4N Oxidation Material

Name: ZnO Ceramic Sputtering Target 4N Oxidation Material
Brand: Dalian King Choice Non-Ferrous Metals Products Co., Ltd.
SKU: Tradewheel_2230763
Availability: InStock

FOB Price 100 - 300 USD / Pieces

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Quick Details (View All)

Place of Origin	Liaoning, China	Type	Ceramic Plates
Application	Ceramic Decorations	Model Number	DCKCCT39
Brand Name	King Choice	Processing Service	Cutting
Purity	99.99%	Size	Customers Drawing
Density	5.16g/cm3

Product Details

Products Description

Product Name	Purity	Density	Processing Method	Surface Condition
Al2O3 Target	4N	3.5g/cm³-3.9g/cm³	HP	Ground
AZO Target	3N5	5.52g/cm3	Sintering
ITO Target	4N	7.15g/cm3	Sintering
Nb2O5 Target	4N	-	HIP
Ta2O5 Target	3N5	5.2	HP
TiO2 Target	3N5	4.24	HP
BaSrTiO3 Target	3N	-	HP		Ground
IGZO Target	4N	-	HP
SiO2 Target	4N	2.2g/cm3	Melt
MgO Target	3N5	3.5g/cm3	HP
Cu2O+Nb2O5 Target	4N	-	HP
TiO2+Nb2O5 Target	4N	-	HP
NiO Target	4N	6.6g/cm3	HP
ZnO Target	4N	5.6g/cm3	HP
ZrO2 Target	3N5	5.46g/cm3	HP
MoO3 Target	3N5	-	HP
WO3 Target	3N5	-	HP
ITZO Target	4N	-	HP
TiO2+AlN Target	3N	-	HP
ZnO+SnO2 Target	4N	-	HP
Cr2O3 Target	3N	-	HP

Application

As an excellent transparent electrode material, ZnO is mainly used in solar cells. Compared with indium tin oxide (ITO) and tin dioxide transparent conductive films used recently, ZnO is non-toxic and highly stable (especially in hydrogen plasma), so there is a tendency to replace ITO and other materials, which is of great significance to promote the development of solar cells.

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