Titanium target, high purity titanium target, coated titanium target, flat target, cylindrical target, arc target

Product Details

Product Categories

metal target

Product introduction

titanium

Product full name

titanium

Product purity

99.9%、99.95%、99.99%

Standard sizes

Φ100×40, Φ100×45, Φ95×45, Φ80×40, Φ90×40, Φ85×35, etc.

Product shape

Flat target, cylindrical target, curved target, special-shaped target

Production Process

Vacuum melting

biggest size

Length ≤ 2000mm, width ≤ 200mm

High purity titanium target product details:

Titanium's atomic number is 22 and its atomic weight is 47.867. It is a silver transition white metal. It is characterized by light weight, high strength, metal coating, and resistance to chlorine wet corrosion. α -type titanium has a hexagonal crystal system, and β-type titanium has a cubic crystal system , with a transition temperature of 882.5°C, a melting point of (1660±10)°C, a boiling point of 3287°C, and a density of 4.506g/cm3. Dissolved in dilute acids, insoluble in cold and hot water, and extremely resistant to salt water.

Titanium alloy has the characteristics of low density, high strength, good corrosion resistance, low thermal conductivity, non-toxic and non-magnetic, weldable, good biocompatibility, and strong surface decoration. Evaluate aviation, aerospace, chemical industry, petroleum, electric power, medical care, construction, sporting goods and other fields.

High-purity titanium has the ability to absorb gases, especially foam, CH4, and CO2 gases. Therefore, it can be used in high vacuum and ultra-high vacuum systems. When high- purity titanium sputtering is used to produce circuit networks of LSI, VLSI, and ULSI, these integrated parts can be made into extremely light, thin, small, and electrode-dense, high-purity titanium target cardiovascular head metal materials.

The titanium targets we supply have fine grains, even distribution, high purity, few inclusions, and high purity. Deposited titanium foil is used in decoration, tool molds , semiconductors and other fields, with good strength, uniform coating and bright colors. For more information please contact us.

The coating target is a sputtering source that sputters various functional films on the substrate under appropriate process conditions through magnetron sputtering, multi-arc ion plating or other types of coating systems. Simply put, the target material is the target material that is hit by high-speed charged particles. It is used in high energy laser weapons. Different power densities, different output waveforms, different wavelengths of lasers will produce different damage and destruction when they respond to different target materials . For example: evaporation magnetron sputtering coating is heated evaporation coating, aluminum film, etc. By replacing different target materials (such as aluminum, copper, stainless steel, titanium, nickel target materials, etc.), different film systems (such as super-hard, wear-resistant, anti-corrosion alloy films, etc.) can be obtained.

Extensively evaluated coating industries such as hardware, decoration, tools, ceramics, and gardening.